プラズマエッチングによるマイクロ流体チップ用チタン製微細金型製造技術の開発

This paper describes the microfabrication of titanium micro molds for the microfluidic chip by a reactive ion etching (RIE) system. The etching was carried out using SF6 plasma. We have examined the etching rate and surface roughness at the range of process pressure 0.3-0.7 Pa and RF (13.56 MHz radi...

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Bibliographic Details
Published inJournal of the Vacuum Society of Japan Vol. 60; no. 4; pp. 145 - 147
Main Authors 人母, 岳, 城木, 正博, 鍋澤, 浩文, 浅地, 豊久, 安部, 隆
Format Journal Article
LanguageJapanese
Published Tokyo 一般社団法人 日本真空学会 01.01.2017
Japan Science and Technology Agency
Subjects
Ion etching
Plasma etching
Polypropylene
Radio frequency
Reactive ion etching
Substrates
Surface roughness
Titanium
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Summary:This paper describes the microfabrication of titanium micro molds for the microfluidic chip by a reactive ion etching (RIE) system. The etching was carried out using SF6 plasma. We have examined the etching rate and surface roughness at the range of process pressure 0.3-0.7 Pa and RF (13.56 MHz radio-frequency) power 30-70 W. The etching rate is over 0.3 μm/min at the RF power of 70 W. The surface roughness of etched substrates is below 40 nm at the process pressure of 0.3 Pa. We made a titanium micro mold and molded microfluidic chips by using polycarbonate, and microresico® (Polypropylene resin).
ISSN:1882-2398
1882-4749
DOI:10.3131/jvsj2.60.145