Characterization of WNx/GaAs Schottky contacts formed by reactive RF sputtering
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Published in | Japanese journal of applied physics Vol. 26; no. 1; pp. 122 - 129 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
1987
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Subjects | |
Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/jjap.26.122 |