Surface reaction kinetics of CH3 in CH4 RF discharge studied by time-resolved threshold ionization mass spectrometry

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Bibliographic Details
Published inJapanese journal of applied physics Vol. 36; no. 7B; pp. 4752 - 4755
Main Authors SHIRATANI, M, JOLLY, J, VIDELOT, H, PERRIN, J
Format Conference Proceeding
LanguageEnglish
Published Tokyo Japanese journal of applied physics 01.07.1997
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Electric discharges
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mass spectrometers and related techniques
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Thin films
Methane
Ionization
Surface reactions
Mass spectroscopy
PECVD
Experimental study
Radiofrequency
Discharge
Threshold
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.36.4752