プラズマ支援反応性プロセスを用いた機能性酸化物薄膜の形成
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| Published in | 溶接学会誌 Vol. 89; no. 7; pp. 472 - 475 |
|---|---|
| Main Authors | , |
| Format | Journal Article |
| Language | Japanese |
| Published |
一般社団法人 溶接学会
2020
|
| Subjects | |
| Online Access | Get full text |
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| Author | 節原, 裕一 竹中, 弘祐 |
|---|---|
| Author_xml | – sequence: 1 fullname: 竹中, 弘祐 organization: 大阪大学 – sequence: 2 fullname: 節原, 裕一 organization: 大阪大学 |
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| Copyright | 2020 社団法人 溶接学会 |
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| DOI | 10.2207/jjws.89.472 |
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| SubjectTerms | IGZO スパッタ 低温プラズマ 薄膜トランジスタ 酸化物半導体 |
| Title | プラズマ支援反応性プロセスを用いた機能性酸化物薄膜の形成 |
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