Preparation of rutile TiO2 films by RF magnetron sputtering
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Published in | Japanese journal of applied physics Vol. 34; no. 9A; pp. 4950 - 4955 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
01.09.1995
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Subjects | |
Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/JJAP.34.4950 |