Diffusion and Distribution Studies of Photoacid Generators: Ion Beam Analysis in Lithography

As the resolution of photoresists is being pushed to its limits, it becomes critical to understand the fundamental mechanisms and interactions among the various components in a photoresist. Chemically amplified photoresist systems have added components such as photoacid generators and dissolution in...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 12; no. 3; pp. 457 - 467
Main Authors Sundararajan, Narayan, Keimel, Christopher F., Bhargava, Navin, Ober, Christopher K., Opitz, Juliann, Allen, Robert D., Barclay, George, Xu, Guangyu
Format Journal Article
LanguageEnglish
Published The Society of Photopolymer Science and Technology(SPST) 1999
Subjects
Diffusion
Distribution
Photoacid Generator
Polarity
Rutherford Backscattering
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Summary:As the resolution of photoresists is being pushed to its limits, it becomes critical to understand the fundamental mechanisms and interactions among the various components in a photoresist. Chemically amplified photoresist systems have added components such as photoacid generators and dissolution inhibitors. Understanding their diffusion characteristics and distribution within the resist thin film becomes important in the design of effective photoresist formulations capable of better imaging performance. We have used Rutherford Backscattering Spectrometry (RBS) as a tool for investigating the diffusion and distribution characteristics of selected photoacid generators and additives in photoresists.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.12.457