In situ AP-XPS analysis of a Pt thin-film sensor for highly sensitive H2 detection

In situ ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) combined with resistivity measurement was performed for a Pt thin-film H2 gas sensor. We experimentally demonstrate that the chemical state of the Pt surface changes under working conditions, and it directly links to the sensing perf...

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Published inChemical communications (Cambridge, England) Vol. 56; no. 70; pp. 10147 - 10150
Main Authors Toyoshima, Ryo, Tanaka, Takahisa, Kato, Taro, Uchida, Ken, Kondoh, Hiroshi
Format Journal Article
LanguageEnglish
Japanese
Published Cambridge Royal Society of Chemistry 01.01.2020
Subjects
Gas sensors
Photoelectrons
Thin films
Working conditions
X ray photoelectron spectroscopy
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Summary:In situ ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) combined with resistivity measurement was performed for a Pt thin-film H2 gas sensor. We experimentally demonstrate that the chemical state of the Pt surface changes under working conditions, and it directly links to the sensing performance. Moreover, the operating principle is discussed at the atomic scale.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
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ISSN:1359-7345
1364-548X
DOI:10.1039/d0cc04030d