An a-Si TFT Array for 15-inch Full-Color High Resolution LCD
We have developed a 15-in. TFT array fabrication process that assures a high production yield for workstation applications. In order to minimize signal delay in our LCDs, we used aluminum for the gate and the source bus-lines.For the gate lines, an aluminum-silicon alloy with a chromium-overcoat was...
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Published in | The Journal of the Institute of Television Engineers of Japan Vol. 47; no. 5; pp. 630 - 635 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | Japanese |
Published |
The Institute of Image Information and Television Engineers
20.05.1993
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Subjects | |
Online Access | Get full text |
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Summary: | We have developed a 15-in. TFT array fabrication process that assures a high production yield for workstation applications. In order to minimize signal delay in our LCDs, we used aluminum for the gate and the source bus-lines.For the gate lines, an aluminum-silicon alloy with a chromium-overcoat was employed to suppress hillock formation. As for the source lines, a titanium barrier was used to prevent aluminum diffusion into the semiconductor layer. In order to reduce the possibilities of open and cross-over short defects, we have developed gate aluminum-silicon alloy and contact hole tapering processes. Furthermore silicon-nitride and tantalum-oxide double insulators were employed. By utilizing this process, a 15-in. full-color TFT-LCD consisting of 1152×900 pixels has been successfully Placed into production. |
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ISSN: | 0386-6831 1884-9652 |
DOI: | 10.3169/itej1978.47.630 |