Analysis of thin film formed on Tenzan stone in abrasive process by synchrotron radiation

• Published in: Journal of the Japan Society for Abrasive Technology Vol. 68; no. 2; pp. 88 - 89
• Main Authors: TATEYAMA, Hiroshi, MAGOME, Eisuke, FUKAYASU, Takahiro, TANAKA, Yoshito
• Format: Journal Article
• Language: English; Japanese
• Published: Tokyo The Japan Society for Abrasive Technology 01.02.2024; 公益社団法人 砥粒加工学会; Japan Science and Technology Agency
• Subjects: Abrasive processes; Abrasives; Amorphous materials; chemical mechanical polishing; Electron probes; Film thickness; grazing incident X-ray diffraction analysis(GIXRD); Silicon dioxide; Stone; Synchrotron radiation; Tenzan stone; thin film; Thin films; Weathering; X-ray fluorescence spectrometry analysis(XRF)
• ISSN: 0914-2703; 1880-7534
• DOI: 10.11420/jsat.68.88

Tenzan stone, which is a domestic stone, has excellent weatherability with almost no aging deterioration even after several decades. However, the reasons for these characteristics have not been clarified. Therefore, surfaces polished with multiple abrasives and unpolished surfaces were analyzed using a laser microscope and Electron Probe Micro Analyzer (EPMA). Analysis using synchrotron radiation showed that this thin film material was amorphous silica with a film thickness of about 1 μm. We found that a thin film was formed on the surface of the stone during the polishing process. The presence of this amorphous silica thin film was assumed to act as a coating agent on the surface of Tenzan stone and contribute to its excellent weatherability.