Properties and technology of sputtering of yttrium iron garnet films for spin-wave electronics

Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films.

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Bibliographic Details
Published in2008 18th International Crimean Conference - Microwave & Telecommunication Technology pp. 552 - 553
Main Authors Nikolaychuk, G.A., Yakovlev, S.V., Lutsev, L.V., Andreev, A.N., Filimonov, V.V.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2008
Subjects
Garnet films
Iron
Magnetic analysis
Magnetic films
Performance analysis
Solids
Sputter etching
Sputtering
Surface contamination
Yttrium
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Summary:Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films.
ISBN:9663351667
9789663351667
DOI:10.1109/CRMICO.2008.4676499