Properties and technology of sputtering of yttrium iron garnet films for spin-wave electronics
Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films.
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Published in | 2008 18th International Crimean Conference - Microwave & Telecommunication Technology pp. 552 - 553 |
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Main Authors | , , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
01.09.2008
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Subjects | |
Online Access | Get full text |
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Summary: | Deposition of yttrium iron garnet films produced by magnetron sputtering are considered. The main consideration is paid to technology methods to obtain stoichiometric composition of sputtered films. |
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ISBN: | 9663351667 9789663351667 |
DOI: | 10.1109/CRMICO.2008.4676499 |