The influence of contact mode on resolution in UV 400 lithography

Optical lithography is the most popular lithographic technique in modern semiconductor manufacture. High pattern resolution is very desirable parameter in many devices. Because of that different contact methods were investigated. In the article we present influence of contact modes between the mask...

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Bibliographic Details
Published in2011 International Students and Young Scientists Workshop "Photonics and Microsystems" pp. 59 - 61
Main Authors Indykiewicz, K., Macherzynski, W., Paszkiewicz, R.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.07.2011
Subjects
Adaptive optics
Gold
Lithography
Optical device fabrication
Photonics
Resists
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Summary:Optical lithography is the most popular lithographic technique in modern semiconductor manufacture. High pattern resolution is very desirable parameter in many devices. Because of that different contact methods were investigated. In the article we present influence of contact modes between the mask and the sample on pattern resolution. We defined the maximal resolution of test structures obtained for various distances of proximity contacts in optical lithography process.
ISBN:1457716518
9781457716515
ISSN:1939-4381
2576-9405
DOI:10.1109/STYSW.2011.6155843