Lateral carrier confinement and threshold current reduction in GaN QW lasers with deeply etched mesa

Shallow etch depths may contribute to a reduction in the optical gain of MQW lasers through the lateral diffusion of carriers away from the region of greatest optical intensity. Deeply etched mesas can prevent this lateral diffusion, but may themselves contribute to a degradation of optical gain if...

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Bibliographic Details
Published inNumerical Simulation of Optoelectronic Devices pp. 51 - 52
Main Authors Satter, M M, Yoder, P D
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2010
Subjects
Gallium nitride
Optical device fabrication
Optical surface waves
Surface emitting lasers
Surface treatment
Threshold current
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Summary:Shallow etch depths may contribute to a reduction in the optical gain of MQW lasers through the lateral diffusion of carriers away from the region of greatest optical intensity. Deeply etched mesas can prevent this lateral diffusion, but may themselves contribute to a degradation of optical gain if the sidewalls are not effectively passivated. Simulation results considering the effects of surface recombination velocity (SRV) at the edge of the etched active layers indicate that SRV must be reduced below approximately 105 cm/s in order for deep etch designs to provide benefit. Very few experimental studies quantify the efficiency of GaN surface passivation in terms of SRV. Further experimental studies are required to better assess the viability of deep etch MQW laser designs.
ISBN:1424470161
9781424470167
ISSN:2158-3234
DOI:10.1109/NUSOD.2010.5595672