Fabrication and modal analysis of ion-implanted LiNbO3 ridge optical waveguide for integrated Erbium-doped amplifiers

The technological process, based on ion implantation and selective etching, for producing ridge waveguides on Lithium Niobate substrates is described and successfully applied. The parameters of the fabricated samples are used in a comprehensive FEM-based modal analysis of an Erbium-doped Lithium Nio...

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Bibliographic Details
Published in2009 International Conference on Photonics in Switching pp. 1 - 2
Main Authors Malacarne, A., Sher, S.M., Montanari, G.B., Sugliani, S., Porzi, C., Poti, L.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2009
Subjects
Er-Doped
Etching
Fabrication
Lithium Niobate
Modal analysis
Nonlinear optics
Optical pumping
Optical refraction
Optical variables control
Optical waveguide
Optical waveguides
Particle beam optics
Refractive index
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Summary:The technological process, based on ion implantation and selective etching, for producing ridge waveguides on Lithium Niobate substrates is described and successfully applied. The parameters of the fabricated samples are used in a comprehensive FEM-based modal analysis of an Erbium-doped Lithium Niobate ridge waveguide. Simulation results support the concept of strong mode confinement at pump wavelength (980 nm) and single mode operation at signal (1550 nm) wavelength.
ISBN:1424438578
9781424438570
ISSN:2155-8507
DOI:10.1109/PS.2009.5307816