Simulation and experiment of inverted pyramid DBD micro-plasma devices array for maskless nanoscale etching

A novel maskless nanoscale material etching method based on microcavities dielectric barrier discharge (DBD) array with advantages of high accuracy and high efficiency has been proposed in this paper. A two-dimensional simulation of pyramidal hollow cathode DBD microplasma operated in Ar has been st...

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Bibliographic Details
Published in2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) pp. 460 - 463
Main Authors Yichuan Dai, Li Wen, Jie Liu, Hai Wang
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.04.2016
Subjects
Dielectrics
Discharges (electric)
Etching
FEM
Mathematical model
MEMS
Micro Dielectric Barrier Discharge
Microcavities
Microplasma
Nanoscale devices
Plasmas
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Summary:A novel maskless nanoscale material etching method based on microcavities dielectric barrier discharge (DBD) array with advantages of high accuracy and high efficiency has been proposed in this paper. A two-dimensional simulation of pyramidal hollow cathode DBD microplasma operated in Ar has been studied using FEM method. Results indicated that high density microplasma with its magnitude of 1e18/m3 is obtained in microcavity. Total absorbed power enhance as relative permittivity of dielectric layer increased. A 3×3 50μm inverted pyramidal microplasma array without dielectric layer has been successfully fabricated by MEMS process and discharged stably in 10kPa Ar, which may lay a good foundation of ongoing DBD microplasma devices array and future maskless nanoscale etching.
DOI:10.1109/NEMS.2016.7758290