Fabrication of nanostructured titania thin film at low temperature

Nanostructured titania (NST) is attracting more and more attention due to its porousness and high surface to volume ratio. A novel process to fabricate integrated NST thin film at low temperature (80-90°C) is presented. NST features were formed by oxidizing Ti films in aqueous hydrogen peroxide. The...

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Bibliographic Details
Published in2008 9th International Conference on Solid-State and Integrated-Circuit Technology pp. 2593 - 2596
Main Authors Guanrong Tang, Jing Chen
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2008
Subjects
Aqueous oxidation
Biological materials
Fabrication
masking material
Microelectronics
Nanobioscience
Nanostructured materials
NST
Oxidation
Surface cracks
Temperature
Titanium
Transistors
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Summary:Nanostructured titania (NST) is attracting more and more attention due to its porousness and high surface to volume ratio. A novel process to fabricate integrated NST thin film at low temperature (80-90°C) is presented. NST features were formed by oxidizing Ti films in aqueous hydrogen peroxide. The optimal conditions of aqueous oxidation are: 85°C, aqueous 10% H 2 O 2 solution, 20 min of water bath time. Crack-free NST features of 100 ¿m × 100 ¿m were successfully fabricated. Two polymer masking materials, SU8 and Parylene, were proved to be compatible with this process, selective NST oxidation could be carried out at an ultra low temperature below 100°C.
ISBN:9781424421855
1424421853
DOI:10.1109/ICSICT.2008.4735103