Transparent all organic TFT fabrication by low cost process without clean room

Here is studied a process for the fabrication of a transparent all organic field effect transistor (OTFT) in a low cost way, without clean room. A major difficulty lies in the fact that substratum is CR39reg, an organic glass. Pentacene, PMMA, and ITO are implemented as respectively semiconductor, i...

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Bibliographic Details
Published inIECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics pp. 4876 - 4881
Main Authors Trigaud, T., El Jazairi, I., Kwon, S.Y., Bernical, V., Moliton, J.P.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.11.2006
Subjects
Conducting materials
Costs
Fabrication
Glass
Indium tin oxide
Insulation
OFETs
Organic thin film transistors
Pentacene
Thin film transistors
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Summary:Here is studied a process for the fabrication of a transparent all organic field effect transistor (OTFT) in a low cost way, without clean room. A major difficulty lies in the fact that substratum is CR39reg, an organic glass. Pentacene, PMMA, and ITO are implemented as respectively semiconductor, insulator, and materials for source, drain and gate electrodes. In preliminary results, ion beam sputtering (IBS) is used as technique for ITO deposition. Transistors characteristics are discussed. To improve the characteristics and increase the reproducibility, a DC magnetron process is proposed for the ITO deposition on CR39reg.Transparency and conductivity of the ITO layer obtained by this method are presented and discussed
ISSN:1553-572X
DOI:10.1109/IECON.2006.347965