Design of embedded memory and logic based on pattern constructs

Design rules become ineffective for interfacing layout design and manufacturing when complex lithography sources are used for sub-20 nm patterning. Experiments demonstrate feasibility of a construct-based design that facilitates control of process capabilities and captures layout dependent variation...

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Bibliographic Details
Published in2011 Symposium on VLSI Technology - Digest of Technical Papers pp. 104 - 105
Main Authors Morris, D., Vaidyanathan, K., Lafferty, N., Lai, K., Liebmann, L., Pileggi, L.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.06.2011
Subjects
Fabrics
Gratings
Layout
Lithography
Optimization
Shape
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Summary:Design rules become ineffective for interfacing layout design and manufacturing when complex lithography sources are used for sub-20 nm patterning. Experiments demonstrate feasibility of a construct-based design that facilitates control of process capabilities and captures layout dependent variations. Results for early 14 nm patterning experiments are shown for logic and memory circuits.
ISBN:9781424499496
1424499496
ISSN:0743-1562