Design and technology co-optimization near single-digit nodes

As we approach single-digit nodes, traditional design for manufacturability is augmented through several methodologies and design paradigms such as design-technology co-optimization (DTCO), systematic yield limiters optimization (SYLO), and design retargeting. We discuss triple-patterning and spacer...

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Bibliographic Details
Published in2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) pp. 582 - 585
Main Authors Liebmann, Lars W., Topaloglu, Rasit O.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.11.2014
Subjects
Color
Layout
Lithography
Metals
Optimization
Semiconductor device modeling
Systematics
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Summary:As we approach single-digit nodes, traditional design for manufacturability is augmented through several methodologies and design paradigms such as design-technology co-optimization (DTCO), systematic yield limiters optimization (SYLO), and design retargeting. We discuss triple-patterning and spacer-based multiple patterning and their design implications as these technologies will be necessary to cruise us to single-digit nodes. With the help of DTCO, there seems to be a clear path to sub-10nm with or without extreme ultra-violet lithography.
ISSN:1092-3152
1558-2434
DOI:10.1109/ICCAD.2014.7001409