Measurement of nanoscale grating structure by Mueller matrix ellipsometry

Spectroscopic ellipsometry technology has extensive applications in semiconductor metrology. Compared with spectroscopic ellipsometry, the Mueller matrix ellipsometry can acquire more useful information about the sample. In this paper, we present the construction of Mueller measurement equipment for...

Full description

Saved in:
Bibliographic Details
Published in2017 China Semiconductor Technology International Conference (CSTIC) pp. 1 - 3
Main Authors Shiqiu Cheng, Fengjiao Zhong, Huiping Chen, Yutao Jia, Yaoming Shi, Yiping Xu
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.03.2017
Subjects
Nanoscale devices
Optical variables measurement
Physics
Online AccessGet full text

Cover

More Information
Summary:Spectroscopic ellipsometry technology has extensive applications in semiconductor metrology. Compared with spectroscopic ellipsometry, the Mueller matrix ellipsometry can acquire more useful information about the sample. In this paper, we present the construction of Mueller measurement equipment for 300 mm integrated circuit production line application and demonstrate the abilities of the equipment for accurate profile characterization of nanoscale structure. Mueller matrix ellipsometry may become a powerful technology for advanced technology node measurement in semiconductor device manufacturing applications.
DOI:10.1109/CSTIC.2017.7919855