APA (7th ed.) Citation

Padovani, A., Larcher, L., Verma, S., Pavan, P., Majhi, P., Kapur, P., . . . Saraswat, K. (2008, March). Feasibility of SIO2/Al2O3 tunnel dielectric for future Flash memories generations. 2008 9th European Workshop on Ultimate Integration on Silicon, 111-114. https://doi.org/10.1109/ULIS.2008.4527152

Chicago Style (17th ed.) Citation

Padovani, A., L. Larcher, S. Verma, P. Pavan, P. Majhi, P. Kapur, K. Parat, G. Bersuker, and K. Saraswat. "Feasibility of SIO2/Al2O3 Tunnel Dielectric for Future Flash Memories Generations." 2008 9th European Workshop on Ultimate Integration on Silicon Mar. 2008: 111-114. https://doi.org/10.1109/ULIS.2008.4527152.

MLA (9th ed.) Citation

Padovani, A., et al. "Feasibility of SIO2/Al2O3 Tunnel Dielectric for Future Flash Memories Generations." 2008 9th European Workshop on Ultimate Integration on Silicon, Mar. 2008, pp. 111-114, https://doi.org/10.1109/ULIS.2008.4527152.