Five-beam Interference Pattern Model for laser interference lithography

• Published in: 2010 International Conference on Information and Automation pp. 1208 - 1213
• Main Authors: Xiangying Deng, Zhen Hu, Guowei Xiu, Dayou Li, Yong Yue, Zhengxun Song, Zhankun Weng, Jia Xu, Zuobin Wang
• Format: Conference Proceeding
• Language: English
• Published: IEEE 01.06.2010
• Subjects: Atomic beams; Electron beams; five-beam interference pattern model; Interference; laser interference lithography; Laser modes; Laser theory; Lithography; Magnetic materials; nano patterning; nano structuring; Optical device fabrication; Optical surface waves; Ultraviolet sources
• ISBN: 1424457017; 9781424457014
• DOI: 10.1109/ICINFA.2010.5512128

Laser interference lithography (LIL) is an established fabrication technology for micro and nano scale structuring of periodic and quasi-periodic surface patterns. This paper presents a Five-beam Interference Pattern Model for laser interference lithography. It can be programmed to obtain images of interference results showing interference intensity distributions. The majority of 2-5 beam interference patterns can be simulated by this model with every variable in an LIL system. In this work, different technologies for nano structuring are introduced, along with the principle of the five-beam interference pattern model. Several images of interference results obtained by the five-beam interference pattern model are shown and some of their possible applications are discussed. Three-beam interference patterns and five-beam interference patterns are formed using a laser beam that goes along the z axis which is not used commonly in other LIL models.