Nanoimprint lithography for high aspect ratio patterns

Nano imprint lithography 1) (NIL) is expected to realize fine pattern fabrication technology for nano optical elements because polymer pattern works itself as an optical element without any additional process,

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Bibliographic Details
Published inDigest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004 pp. 126 - 127
Main Authors Konishi, T., Kanakugi, T., Toyota, H., Kawata, H., Hirai, Y.
Format Conference Proceeding
LanguageEnglish
Published IEEE 2004
Subjects
High speed optical techniques
Lenses
Nanolithography
Optical device fabrication
Optical polymers
Optical retarders
Optical switches
Resists
Stress
Surface treatment
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Summary:Nano imprint lithography 1) (NIL) is expected to realize fine pattern fabrication technology for nano optical elements because polymer pattern works itself as an optical element without any additional process,
ISBN:4990247205
9784990247201
DOI:10.1109/IMNC.2004.245756