A complete Process Design Kit verification flow and platform for 28nm technology and beyond

Process Design Kit (PDK) is becoming extremely complex in order to address variability from different sources such as layout-dependent effects at 28nm node and beyond. The increasing importance of layout parasitic also brings more complexity into PDK verifications. This paper reports and demonstrate...

Full description

Saved in:
Bibliographic Details
Published in2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology pp. 1 - 4
Main Authors Yanfeng Li, Miao Li, Waisum Wong
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2012
Subjects
Analytical models
Foundries
Integrated circuit modeling
Layout
layout dependent effect
Lithography
Process Design Kit
SPICE
STRAIN
Stress
variability
Online AccessGet full text

Cover

More Information
Summary:Process Design Kit (PDK) is becoming extremely complex in order to address variability from different sources such as layout-dependent effects at 28nm node and beyond. The increasing importance of layout parasitic also brings more complexity into PDK verifications. This paper reports and demonstrates a verification flow and platform to qualify the advanced PDKs with focus on addressing layout-dependent effects and layout parasitic. This platform is successfully being applied for 28nm technology. Test structures and methodologies of verifying layout-dependent components and parasitic extractions are presented.
ISBN:9781467324748
1467324744
DOI:10.1109/ICSICT.2012.6467921