Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties

The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The...

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Bibliographic Details
Published in2012 7th International Forum on Strategic Technology (IFOST) pp. 1 - 4
Main Authors Morozova, N., Konishchev, M., Pustovalova, A., Bykova, Y., Grebneva, I., Kuzmin, O., Pichugin, V.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2012
Subjects
Coatings
deposition
Discharges (electric)
magnetron reactive sputtering
Plasmas
Sputtering
Surface treatment
Titanium
titanium oxides and oxynitride
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Summary:The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM). Mechanical characteristics of obtained films which include their roughness, nano-hardness (H) and Young's modulus (E) were studied.
ISBN:9781467317726
1467317721
DOI:10.1109/IFOST.2012.6357769