A characterization of the radiation from a rod-pinch diode

Coupled PIC-Monte-Carlo simulations of the electron-flow and radiation production in a rod-pinch diode show that multiple scatterings in the rod produce incident electron energies that ranging from zero to slightly higher than the applied voltage. It is speculated that those electrons that gain ener...

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Published in2002 14th International Conference on High-Power Particle Beams (BEAMS) Vol. 1; pp. 179 - 182
Main Authors Swanekamp, Stephen B., Allen, Raymond J., Hinshelwood, David D., Mosher, David, Schumer, Joseph W.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.06.2002
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Summary:Coupled PIC-Monte-Carlo simulations of the electron-flow and radiation production in a rod-pinch diode show that multiple scatterings in the rod produce incident electron energies that ranging from zero to slightly higher than the applied voltage. It is speculated that those electrons that gain energy do so by remaining in phase with a rapidly varying electric field near the tip of the rod. The simulations also show that multiple passes in the rod produce a wide spread in incident electron angles. For diode voltages of V=2 MV, the angular distribution of electrons incident on the rod is broad and peaked near 90° to the axis of the rod with a larger fraction of electrons striking the rod at angles less than 90°. The electron angular distribution for V=4 MV is narrower and peaked at 105° with a larger fraction of electrons incident on the rod with angles greater than 90°. The photon distributions are peaked along the direction of the high-energy electrons. For V=2 MV the dose filtered through 2¼-cm thick Plexiglas is peaked at 90° and is 1.8 times higher than the forward-directed [0°] dose. For V=4 MV the dose filtered through 2¼-cm thick Plexiglas is peaked at 120° and is 2.3 times higher than the forward-directed dose. Similar angular variation of the dose has been observed on the 4-MV Asterix accelerator [2] and on 1-2 MV accelerators at the Atomic Weapons Establishment [8].
ISBN:9780735401075
0735401071
DOI:10.1063/1.1530830