Nonvolatile 32×32 crossbar atom switch block integrated on a 65-nm CMOS platform

A 32×32-crossbar complementary-atom-switch (CAS) block has been successfully integrated in a 65nm-node CMOS platform without degrading CMOS properties. The CAS connecting to two Cu lines at each edge is composed of a dual layered electrolyte of TiO 2 /polymer, which prevents Cu oxidation during the...

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Bibliographic Details
Published in2012 Symposium on VLSI Technology (VLSIT) pp. 39 - 40
Main Authors Banno, N., Tada, M., Sakamoto, T., Okamoto, K., Miyamura, M., Iguchi, N., Nohisa, T., Hada, H.
Format Conference Proceeding
LanguageEnglish
Japanese
Published IEEE 01.06.2012
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Summary:A 32×32-crossbar complementary-atom-switch (CAS) block has been successfully integrated in a 65nm-node CMOS platform without degrading CMOS properties. The CAS connecting to two Cu lines at each edge is composed of a dual layered electrolyte of TiO 2 /polymer, which prevents Cu oxidation during the fabrication of the switch and Cu BEOL. The reduction of Cu-surface roughness and the electric field concentration at the edge of Cu electrode enable a high I on /I off ratio and a low programming voltages of 1.8V with distribution as low as σ=0.2V.
ISBN:9781467308465
1467308463
ISSN:0743-1562
DOI:10.1109/VLSIT.2012.6242450