Nonvolatile 32×32 crossbar atom switch block integrated on a 65-nm CMOS platform
A 32×32-crossbar complementary-atom-switch (CAS) block has been successfully integrated in a 65nm-node CMOS platform without degrading CMOS properties. The CAS connecting to two Cu lines at each edge is composed of a dual layered electrolyte of TiO 2 /polymer, which prevents Cu oxidation during the...
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Published in | 2012 Symposium on VLSI Technology (VLSIT) pp. 39 - 40 |
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Main Authors | , , , , , , , |
Format | Conference Proceeding |
Language | English Japanese |
Published |
IEEE
01.06.2012
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Subjects | |
Online Access | Get full text |
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Summary: | A 32×32-crossbar complementary-atom-switch (CAS) block has been successfully integrated in a 65nm-node CMOS platform without degrading CMOS properties. The CAS connecting to two Cu lines at each edge is composed of a dual layered electrolyte of TiO 2 /polymer, which prevents Cu oxidation during the fabrication of the switch and Cu BEOL. The reduction of Cu-surface roughness and the electric field concentration at the edge of Cu electrode enable a high I on /I off ratio and a low programming voltages of 1.8V with distribution as low as σ=0.2V. |
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ISBN: | 9781467308465 1467308463 |
ISSN: | 0743-1562 |
DOI: | 10.1109/VLSIT.2012.6242450 |