Influence of MnO2 Doping on the Dielectric and Piezoelectric Properties and the Domain Structure in (K0.5Na0.5)NbO3 Single Crystals

MnO2‐doped (K0.5Na0.5)NbO3 (KNN) single crystals were grown by high‐temperature solution method using K2CO3–Na2CO3 eutectic composition as flux. The effect of the manganese dopant on the dielectric, piezoelectric properties and the domain structure was investigated. The MnO2‐doped KNN crystals were...

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Published inJournal of the American Ceramic Society Vol. 93; no. 4; pp. 941 - 944
Main Authors Lin, Dabin, Li, Zhenrong, Zhang, Shujun, Xu, Zhuo, Yao, Xi
Format Journal Article
LanguageEnglish
Published Malden, USA Blackwell Publishing Inc 01.04.2010
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Summary:MnO2‐doped (K0.5Na0.5)NbO3 (KNN) single crystals were grown by high‐temperature solution method using K2CO3–Na2CO3 eutectic composition as flux. The effect of the manganese dopant on the dielectric, piezoelectric properties and the domain structure was investigated. The MnO2‐doped KNN crystals were found to exhibit higher piezoelectric coefficient d33 and dielectric permittivity ɛr when compared with pure KNN crystal, being on the order of 270 pC/N and 730, respectively, for manganese‐doped level at 0.5 mol%, with slightly reduced orthorhombic to tetragonal phase transition TO—T, and Curie temperature TC, being on the order of 193° and 416°C, respectively. The domain size of [001]‐oriented KNN–Mn crystal was found to be on the order of 5–13 μm at room temperature, smaller than that of the domain size observed in the pure KNN crystal (20–30 μm). The thermal depoling experiments were performed on the [001]‐poled KNN–Mn crystals, where the partial depolarization was found to occur at temperatures above 200°C, due to the phase transformation.
Bibliography:istex:CFBE08450573567E94E2789A335C2B4933267ED4
ark:/67375/WNG-WPCSPDKS-8
ArticleID:JACE03501
K.‐I. Kakimoto—contributing editor
The work was supported by the National Natural Science Foundation of China No. 50872106 and the National Basic Research Program of China (973 Program) No. 2009CB23306.
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ISSN:0002-7820
1551-2916
DOI:10.1111/j.1551-2916.2009.03501.x