Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells
ABSTRACT Cu2ZnSnS4 (CZTS) is a promising thin‐film absorber material that presents some interesting challenges in fabrication when compared with Cu(In,Ga)Se2. We introduce a two‐step process for fabrication of CZTS films, involving reactive sputtering of a Cu‐Zn‐Sn‐S precursor followed by rapid anne...
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Published in | Progress in photovoltaics Vol. 22; no. 1; pp. 10 - 17 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Bognor Regis
Blackwell Publishing Ltd
01.01.2014
Wiley Wiley Subscription Services, Inc |
Subjects | |
Online Access | Get full text |
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Summary: | ABSTRACT
Cu2ZnSnS4 (CZTS) is a promising thin‐film absorber material that presents some interesting challenges in fabrication when compared with Cu(In,Ga)Se2. We introduce a two‐step process for fabrication of CZTS films, involving reactive sputtering of a Cu‐Zn‐Sn‐S precursor followed by rapid annealing. X‐ray diffraction and Raman measurements of the sputtered precursor suggest that it is in a disordered, metastable CZTS phase, similar to the high‐temperature cubic modification reported for CZTS. A few minutes of annealing at 550 °C are sufficient to produce crystalline CZTS films with grain sizes in the micrometer range. The first reported device using this approach has an AM1.5 efficiency of 4.6%, with Jsc and Voc both appearing to be limited by interface recombination. Copyright © 2012 John Wiley & Sons, Ltd.
Cu2ZnSnS4 is a promising thin‐film absorber material that presents some interesting challenges in fabrication when compared with Cu(In,Ga)Se2. Here, we demonstrate the development of large Cu2ZnSnS4 grains during rapid annealing of reactively sputtered Cu‐Zn‐Sn‐S precursor films. A metastable precursor phase is proposed to explain structural properties and the high rate of grain growth. |
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Bibliography: | ark:/67375/WNG-4W3D51X9-2 ArticleID:PIP2265 istex:57E6C665B80575B875E6797221C2076F155395A9 |
ISSN: | 1062-7995 1099-159X 1099-159X |
DOI: | 10.1002/pip.2265 |