Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography

• Published in: Nanotechnology Vol. 24; no. 19; p. 195301
• Main Authors: Choi, Je-Hong, Jo, Han-Byeol, Choi, Hak-Jong, Lee, Heon
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 17.05.2013; Institute of Physics
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of nanofabrication; Nanocrystalline materials; Nanoscale materials and structures: fabrication and characterization; Nanoscale pattern formation; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures; Physics; Nanoparticles; Quantity ratio; Nanopatterning; Refractive index; Optical properties; Ultraviolet lithography; Nanoimprint lithography; Aspect ratio; Nanostructured materials; Monomers; Nanomaterial synthesis
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/0957-4484/24/19/195301

TiO2-nanoparticle-dispersed resin was prepared to form various nanoscaled structures using UV nanoimprint lithography (UV NIL). This resin-made of TiO2 nanoparticles, a monomer, solvent, and UV initiator-showed variations in refractive index depending on the nanoparticle concentration. TiO2 nano-to-microscale patterns were fabricated on various substrates such as Si wafer and glass, and even on flexible substrates, by using UV NIL, which offers advantages such as low cost, large area, and high throughput. Low-aspect-ratio, high-aspect-ratio, and microconvex patterns were fabricated using the NIL process. The optical properties of the patterns were analyzed using UV-vis spectrophotometry.