Ultrahigh photoresponsivity MoS2 photodetector with tunable photocurrent generation mechanism

Photodetectors with two-dimensional (2D) materials on a SiO2/Si substrate have been extensively explored. However, these photodetectors often suffer from a large gate voltage and relatively low photoresponsivity due to the low efficiency light absorption of 2D materials. Here, we develop a MoS2 phot...

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Published inNanotechnology Vol. 29; no. 48; p. 485204
Main Authors Wu, Guangjian, Wang, Xudong, Chen, Yan, Wang, Zhen, Shen, Hong, Lin, Tie, Hu, Weida, Wang, Jianlu, Zhang, Shantao, Meng, Xiangjian, Chu, Junhao
Format Journal Article
LanguageEnglish
Published England IOP Publishing 30.11.2018
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Summary:Photodetectors with two-dimensional (2D) materials on a SiO2/Si substrate have been extensively explored. However, these photodetectors often suffer from a large gate voltage and relatively low photoresponsivity due to the low efficiency light absorption of 2D materials. Here, we develop a MoS2 photodetector based on the Al2O3/ITO (indium tin oxide)/SiO2/Si substrate with ultrahigh photoresponsivity of 2.7 × 104 A W−1. Most of the incident light is reflected by the interface of stacked Al2O3/ITO/SiO2 substrate, which significantly increases the light absorption of 2D materials. With the help of thinner and high-κ Al2O3 dielectric, the current ON/OFF ratio could exceed 109 with a gate voltage no more than 2 V. Enhanced gate regulation also brings about a relatively high mobility of 84 cm2 V−1 s−1 and subthreshold swing of 104 mV dec−1. Additionally, two different photocurrent generation mechanisms have also been revealed by tuning the gate voltage. The reflection-enhancement substrate assisted MoS2 photodetector provides a new idea for improving the performance of 2D material photodetectors, which can be perfectly combined with other methods.
Bibliography:NANO-118517.R1
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ISSN:0957-4484
1361-6528
DOI:10.1088/1361-6528/aae17e