Optimized-geometry ARROW waveguides using TiO2 as anti-resonant layer

• Published in: Physica status solidi. C Vol. 7; no. 3-4; pp. 716 - 719
• Main Authors: Carvalho, Daniel O., Albertin, Katia F., Alayo, Marco I.
• Format: Journal Article
• Language: English
• Published: Berlin WILEY-VCH Verlag 01.04.2010; WILEY‐VCH Verlag
• Subjects: 42.70.Ce; 42.79.Gn; 42.82.Cr; 42.82.Et; 81.05.Gc; 81.15.Gh; Chemical vapor deposition; Computer simulation; Finite difference method; Mathematical models; Optimization; Reproduction; Titanium dioxide; Waveguides
• ISSN: 1862-6351; 1610-1642; 1610-1642
• DOI: 10.1002/pssc.200982795

The simulation, fabrication and characterization of ARROW waveguides using dielectric films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and Sputtering techniques, are presented in this work. Amorphous titanium oxide (TiO2) films were used as first cladding layer and silicon oxynitride (SiOxNy) films, as core layer. Furthermore, homemade routines based in two computational methods were used, for numerical simulations: Transfer Matrix Method (TMM) for the determination of the optimum thickness values of the Fabry‐Perot layers, and the Finite Difference Method (FDM) for 2D design and determination of the maximum width that allows single‐mode operation. The utilization of thermally grown silicon oxide as second anti‐resonant layer, along with improvements in the Reactive Ion Etching conditions for the definition of sidewalls of the optical waveguides were responsible for diminishing optical attenuations. Optimization of the waveguide rib height was done both through FDM simulations and experimentally. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)