Effective roughness reduction of {100} and {311} planes in anisotropic etching of {100} silicon in 5% TMAH
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Published in | Journal of micromechanics and microengineering Vol. 13; no. 1; pp. 26 - 34 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.01.2003
Institute of Physics |
Subjects | |
Online Access | Get full text |
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ISSN: | 0960-1317 1361-6439 |
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DOI: | 10.1088/0960-1317/13/1/304 |