Effects of low-energy ion bombardment on RF sputtered MoS2-x films

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 22; no. 1; pp. 238 - 240
Main Authors Gribi, P, Sun, Z W, Levy, F
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 14.01.1989
Institute of Physics
Subjects
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Crystal growth
Scanning electron microscopy
Molybdenum Sulfides
Densification
Oblique incidence
Transition metal Compounds
Ions
Experimental study
Non stoichiometric composition
Inorganic compound
Thin film
Transmission electron microscopy
Argon Atomic ions
Irradiation
Microstructure
Radiofrequency sputtering
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More Information
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/22/1/037