On the implementation of device processing tolerances in FET Large Signal Models

Device technology is becoming quite mature and repeatable, but nevertheless, for various reasons, there are statistical variations in device parameters. These process variations will influence the accuracy of the designs and yield in production. The implementation of these variations in Large Signal...

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Bibliographic Details
Published in2012 Workshop on Integrated Nonlinear Microwave and Millimetre-Wave Circuits, INMMIC 2012 pp. 1 - 3
Main Authors Angelov, I., Ferndahl, M., Gavell, M.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2012
Subjects
FET
Gallium arsenide
Indexes
Large Signal Models
Statistical Models
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Summary:Device technology is becoming quite mature and repeatable, but nevertheless, for various reasons, there are statistical variations in device parameters. These process variations will influence the accuracy of the designs and yield in production. The implementation of these variations in Large Signal Models is discussed in the paper.
ISBN:1467329509
9781467329507
1467329495
9781467329491
DOI:10.1109/INMMIC.2012.6331917