Low temperature atomic layer deposited HfO2 film for high performance charge trapping flash memory application
The impact of key process parameters on the electrical characteristics of atomic layer deposited HfO2 films has been systematically studied with MHOS devices via capacitance-voltage (C-V) measurement. C-V hysteresis curves revealed that charge storage capacity is significantly enhanced with decreasi...
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Published in | Semiconductor science and technology Vol. 29; no. 4 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
IOP Publishing
01.04.2014
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Subjects | |
Online Access | Get full text |
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Summary: | The impact of key process parameters on the electrical characteristics of atomic layer deposited HfO2 films has been systematically studied with MHOS devices via capacitance-voltage (C-V) measurement. C-V hysteresis curves revealed that charge storage capacity is significantly enhanced with decreasing substrate temperature from 350 down to 150 °C and or increasing purge time of the inert gas. The developed HfO2 trapping layer was also demonstrated by a MAHOS memory device. Improved memory window, fast program speed and good retention characteristics have been obtained. The study provides a reference for memory performance improvement of HfO2-based charge trap flash memory. |
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Bibliography: | SST-100368.R1 |
ISSN: | 0268-1242 1361-6641 |
DOI: | 10.1088/0268-1242/29/4/045019 |