Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO2 deposition process drifts

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Bibliographic Details
Published inPhysica scripta Vol. 99; no. 4
Main Authors Boivin, D, Jean-Marie-Désirée, R, Najah, A, Cuynet, S, de Poucques, L
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.04.2024
Subjects
low pressure plasmas
optical emission spectroscopy
process monitoring
R-HiPIMS
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Bibliography:PHYSSCR-127540.R2
ISSN:0031-8949
1402-4896
DOI:10.1088/1402-4896/ad3302