Influence of CH4 Flow Rate on Microstructure and Properties of Ti-C:H Films Deposited by DC Reactive Magnetron Sputtering

• Published in: Tribology transactions Vol. 60; no. 5; pp. 852 - 860
• Main Authors: Zhou, Shengguo, Liu, Long, Ma, Liqiu, Wang, Yuechen, Liu, Zhengbing
• Format: Journal Article
• Language: English
• Published: Taylor & Francis 03.09.2017
• Subjects: magnetron sputtering; microstructure; Ti-C:H; tribological properties
• DOI: 10.1080/10402004.2016.1223387
• ISSN: 1040-2004

Nanocomposite Ti-containing hydrogenated carbon films (Ti-C:H) were prepared using a DC reactive magnetron sputtering system. The relationship between CH 4 flow rate and the film characterization and tribological behaviors in both ambient air and deionized water conditions were investigated. Results showed that the Ti content in the as-deposited Ti-C:H films decreased and the sp 3 content increased with an increase in CH 4 flow rate. TiC nanocrystallites can be formed at a relatively low CH 4 flow rate, whereas there was almost no formation of TiC in the amorphous carbon matrix at the highest CH 4 flow rate. The hardness, elastic modulus, and internal stress of the films were decreased firstly and then increased as the CH 4 flow rate increased, whereas their adhesion presented an inversely changing trend. The friction coefficients and wear rates of Ti-C:H films in both ambient air and deionized water conditions decreased with increasing CH 4 flow rate from 8 to 12 sccm and then increased as the CH 4 flow rate continually increased. In particular, the nanocomposite Ti-C:H film deposited with a CH 4 flow rate of 12 sccm could achieve superior combining mechanical properties and low friction and high antiwear behaviors in both ambient air and deionized water conditions, indicating potential applications as a protective and lubricating film for mechanical components.