Influence of CH4 Flow Rate on Microstructure and Properties of Ti-C:H Films Deposited by DC Reactive Magnetron Sputtering
Nanocomposite Ti-containing hydrogenated carbon films (Ti-C:H) were prepared using a DC reactive magnetron sputtering system. The relationship between CH 4 flow rate and the film characterization and tribological behaviors in both ambient air and deionized water conditions were investigated. Results...
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Published in | Tribology transactions Vol. 60; no. 5; pp. 852 - 860 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Taylor & Francis
03.09.2017
|
Subjects | |
Online Access | Get full text |
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Summary: | Nanocomposite Ti-containing hydrogenated carbon films (Ti-C:H) were prepared using a DC reactive magnetron sputtering system. The relationship between CH
4
flow rate and the film characterization and tribological behaviors in both ambient air and deionized water conditions were investigated. Results showed that the Ti content in the as-deposited Ti-C:H films decreased and the sp
3
content increased with an increase in CH
4
flow rate. TiC nanocrystallites can be formed at a relatively low CH
4
flow rate, whereas there was almost no formation of TiC in the amorphous carbon matrix at the highest CH
4
flow rate. The hardness, elastic modulus, and internal stress of the films were decreased firstly and then increased as the CH
4
flow rate increased, whereas their adhesion presented an inversely changing trend. The friction coefficients and wear rates of Ti-C:H films in both ambient air and deionized water conditions decreased with increasing CH
4
flow rate from 8 to 12 sccm and then increased as the CH
4
flow rate continually increased. In particular, the nanocomposite Ti-C:H film deposited with a CH
4
flow rate of 12 sccm could achieve superior combining mechanical properties and low friction and high antiwear behaviors in both ambient air and deionized water conditions, indicating potential applications as a protective and lubricating film for mechanical components. |
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ISSN: | 1040-2004 1547-397X |
DOI: | 10.1080/10402004.2016.1223387 |