Sol-gel imprint lithography for guided mode resonance structures

A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been...

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Bibliographic Details
Published in2015 IEEE Photonics Conference (IPC) pp. 367 - 368
Main Authors Yin Huang, Longju Liu, Ch'ng, Benjamin, Meng Lu
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2015
Subjects
Dielectrics
Glass
Gratings
Optical device fabrication
Optical waveguides
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Summary:A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been successfully fabricated and characterized.
ISSN:1092-8081
2766-1733
DOI:10.1109/IPCon.2015.7323457