High Volume Semiconductor Manufacturing Using Nanoimprint Lithography

Any new lithographic technology to be introduced into manufacturing must deliver either a performance advantage or a cost advantage. Key technical attributes include alignment, overlay and throughput. In this work, we review progress on pattern capability, throughput, mask life and overlay.

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Published in2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) pp. 1 - 4
Main Authors Takabayashi, Yukio, Iwanaga, Takehiko, Hiura, Mitsuru, Morohoshi, Hiroshi, Hayashi, Tatsuya, Komaki, Takamitsu, Morimoto, Osamu, Sakai, Keita, Zhang, Wei, Cherala, Anshuman, Im, Se-Hyuk, Meissl, Mario, Choi, Jin
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.04.2020
Subjects
Actuators
Bending
Costs
Distortion
HODC
Manufacturing
mask life
nanoimprint lithography
NIL
overlay
Random access memory
resolution
Throughput
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Abstract Any new lithographic technology to be introduced into manufacturing must deliver either a performance advantage or a cost advantage. Key technical attributes include alignment, overlay and throughput. In this work, we review progress on pattern capability, throughput, mask life and overlay.
AbstractList Any new lithographic technology to be introduced into manufacturing must deliver either a performance advantage or a cost advantage. Key technical attributes include alignment, overlay and throughput. In this work, we review progress on pattern capability, throughput, mask life and overlay.
Author Cherala, Anshuman
Hayashi, Tatsuya
Komaki, Takamitsu
Morimoto, Osamu
Choi, Jin
Morohoshi, Hiroshi
Takabayashi, Yukio
Zhang, Wei
Im, Se-Hyuk
Meissl, Mario
Hiura, Mitsuru
Iwanaga, Takehiko
Sakai, Keita
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  organization: Canon Nanotechnologies Inc.,1807 West Braker Lane, Bldg. C-300, Austin,TX,USA,78758
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SubjectTerms Actuators
Bending
Costs
Distortion
HODC
Manufacturing
mask life
nanoimprint lithography
NIL
overlay
Random access memory
resolution
Throughput
Title High Volume Semiconductor Manufacturing Using Nanoimprint Lithography
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