Pinch dynamics of the 13.5 nm EUV-emitting plasma in a LA-DPP source

Pinch dynamics of the imploding plasma and its relations with the 13.5 nm extreme ultraviolet (EUV) emissions have been experimentally investigated for a laser assisted Sn based discharge produced plasma (LA-DPP) EUV source. Plasma behaviors during the discharge are clarified using the laser aided s...

Full description

Saved in:
Bibliographic Details
Published in2011 Academic International Symposium on Optoelectronics and Microelectronics Technology pp. 172 - 175
Main Authors Qiushi Zhu, Yamada, J., Kishi, N., Hosokai, T., Watanabe, M., Okino, A., Horioka, K., Hotta, E.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2011
Subjects
13.5 nm EUV source
Anodes
Discharges
Fault location
interferometry
LA-DPP
plasma diagnostics
Plasmas
Tin
Ultraviolet sources
Z-pinch
Online AccessGet full text

Cover

More Information
Summary:Pinch dynamics of the imploding plasma and its relations with the 13.5 nm extreme ultraviolet (EUV) emissions have been experimentally investigated for a laser assisted Sn based discharge produced plasma (LA-DPP) EUV source. Plasma behaviors during the discharge are clarified using the laser aided shadowgraphic technique. Temporally and spatially resolved electron density distributions obtained by using Nomarski interferometry reveal that the maximum EUV emission corresponds to the electron density of (2.0-3.0)×10 18 cm -3 . The ion fraction and electron temperature of the pre-pinch plasma are estimated using a stationary collisional-radiative model.
ISBN:1457707942
9781457707940
DOI:10.1109/AISMOT.2011.6159346