Graphene-Based Complementary-Style Logic Gate with Memory-Lock
As CMOS feature size vertiginously approaches atomic limits, high leakage and power density and exacer-bating IC production costs are prompting for development of new materials, devices, beyond von-Neumann architectures and computing paradigms. Within this context, graphene has emerged as a promisin...
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Published in | Proceedings of the ... IEEE Conference on Nanotechnology pp. 586 - 591 |
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Main Authors | , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
08.07.2024
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Subjects | |
Online Access | Get full text |
ISSN | 1944-9380 |
DOI | 10.1109/NANO61778.2024.10628771 |
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Summary: | As CMOS feature size vertiginously approaches atomic limits, high leakage and power density and exacer-bating IC production costs are prompting for development of new materials, devices, beyond von-Neumann architectures and computing paradigms. Within this context, graphene has emerged as a promising post-Si front runner, owing to its remarkable properties. In this paper, we propose a generic graphene-based complementary-style Boolean gate structure with memory-lock, that allows logic and non-volatile memory co-location. The gate with memory-lock is composed of 2 cells - a pull-up cell performing the gate Boolean function and a pull-down cell performing the inverted Boolean function. Each cell in turn, has a graphene logic layer that carries out Boolean gates computation, and a graphene memory layer for storing the logic state of the gate. As simulation vehicle we considered an inverter gate with memory-lock. Simulation results indicate a current ratio of write/read to/from memory of 1.64.10 2 for gate input low, and of 2.55. 10 2 for gate input high. Furthermore, the inverter with memory-lock exhibits a 128× smaller area footprint when compared to the traditional physically separate logic (e.g., 7nm inverter gate) and memory (e.g., 7nm 6T SRAM cell), establishing the potential of proposed structure with memory-lock for more compact and energy efficient future beyond CMOS nano-electronic implementations, and making it highly promising for high-density computations. |
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ISSN: | 1944-9380 |
DOI: | 10.1109/NANO61778.2024.10628771 |