Copper direct bonding for 3D integration

In 3D integration circuits, metal bonding is a key stage for stacking wafers. In this contribution, the direct Cu/Cu bonding at atmospheric pressure is investigated. At room temperature, a 2.8 J/m 2 bonding toughness is achieved without copper oxide at the interface. The vertical current of this bon...

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Published in2008 International Interconnect Technology Conference pp. 61 - 63
Main Authors Gueguen, Pierric, di Cioccio, Lea, Rivoire, Maurice, Scevola, Daniel, Zussy, Marc, Charvet, Anne Marie, Bally, Laurent, Lafond, Dominique, Clavelier, Laurent
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.06.2008
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Abstract In 3D integration circuits, metal bonding is a key stage for stacking wafers. In this contribution, the direct Cu/Cu bonding at atmospheric pressure is investigated. At room temperature, a 2.8 J/m 2 bonding toughness is achieved without copper oxide at the interface. The vertical current of this bonding and the possibility to grind the top silicon down to 10 μm have been demonstrated.
AbstractList In 3D integration circuits, metal bonding is a key stage for stacking wafers. In this contribution, the direct Cu/Cu bonding at atmospheric pressure is investigated. At room temperature, a 2.8 J/m 2 bonding toughness is achieved without copper oxide at the interface. The vertical current of this bonding and the possibility to grind the top silicon down to 10 μm have been demonstrated.
Author di Cioccio, Lea
Clavelier, Laurent
Scevola, Daniel
Charvet, Anne Marie
Zussy, Marc
Lafond, Dominique
Gueguen, Pierric
Bally, Laurent
Rivoire, Maurice
Author_xml – sequence: 1
  givenname: Pierric
  surname: Gueguen
  fullname: Gueguen, Pierric
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France, e-mail: pierric.gueguen@cea.fr
– sequence: 2
  givenname: Lea
  surname: di Cioccio
  fullname: di Cioccio, Lea
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 3
  givenname: Maurice
  surname: Rivoire
  fullname: Rivoire, Maurice
  organization: STMicroelectronics, 850 rue Jean Monnet, 38920 Crolles Cedex - France
– sequence: 4
  givenname: Daniel
  surname: Scevola
  fullname: Scevola, Daniel
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 5
  givenname: Marc
  surname: Zussy
  fullname: Zussy, Marc
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 6
  givenname: Anne Marie
  surname: Charvet
  fullname: Charvet, Anne Marie
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 7
  givenname: Laurent
  surname: Bally
  fullname: Bally, Laurent
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 8
  givenname: Dominique
  surname: Lafond
  fullname: Lafond, Dominique
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
– sequence: 9
  givenname: Laurent
  surname: Clavelier
  fullname: Clavelier, Laurent
  organization: CEA Léti - MINATEC, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
BookMark eNo9kL1OwzAYRQ20Ek3JAyCWjCwJ_j47_hlRyk-kSiwZ2ContisjcCInC29PJQp3udI90hluRlZxjI6QW6AVANUPbds1FVKqKl5zoVFckFxLBRw5Bw2oLskGmaKlYExdkewPQL36B_i-JtnJITVVWuprks_zBz2F1wwF25D7ZpwmlwobkhuWoh-jDfFY-DEVbFeEuLhjMksY4w1Ze_M5u_zcW9I9P3XNa7l_e2mbx30ZQNZL6SX0zgwSwUpleW9A8AG5OO3MCS5B1cIyNEC9s95r22uGqAyXzoI2bEvufrXBOXeYUvgy6ftwPoD9AMIOSKY
ContentType Conference Proceeding
DBID 6IE
6IL
CBEJK
RIE
RIL
DOI 10.1109/IITC.2008.4546926
DatabaseName IEEE Electronic Library (IEL) Conference Proceedings
IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume
IEEE Xplore All Conference Proceedings
IEEE Electronic Library (IEL)
IEEE Proceedings Order Plans (POP All) 1998-Present
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library (IEL)
  url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISBN 9781424419128
1424419123
EISSN 2380-6338
EndPage 63
ExternalDocumentID 4546926
Genre orig-research
GroupedDBID 6IE
6IF
6IK
6IL
6IN
AAJGR
ACGFS
ADZIZ
ALMA_UNASSIGNED_HOLDINGS
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CBEJK
CHZPO
IPLJI
M43
OCL
RIE
RIL
ID FETCH-LOGICAL-i175t-f71beac721d78d4ba164c246f713e6471856d32a10fedff9db93228a47ed19a3
IEDL.DBID RIE
ISBN 1424419115
9781424419111
ISSN 2380-632X
IngestDate Wed Jun 26 19:24:11 EDT 2024
IsPeerReviewed false
IsScholarly false
LCCN 2007908979
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-i175t-f71beac721d78d4ba164c246f713e6471856d32a10fedff9db93228a47ed19a3
PageCount 3
ParticipantIDs ieee_primary_4546926
PublicationCentury 2000
PublicationDate 2008-June
PublicationDateYYYYMMDD 2008-06-01
PublicationDate_xml – month: 06
  year: 2008
  text: 2008-June
PublicationDecade 2000
PublicationTitle 2008 International Interconnect Technology Conference
PublicationTitleAbbrev IITC
PublicationYear 2008
Publisher IEEE
Publisher_xml – name: IEEE
SSID ssj0000453263
ssj0020143
Score 1.5588311
Snippet In 3D integration circuits, metal bonding is a key stage for stacking wafers. In this contribution, the direct Cu/Cu bonding at atmospheric pressure is...
SourceID ieee
SourceType Publisher
StartPage 61
SubjectTerms Bonding
Copper
Decision support systems
Quadratic programming
Title Copper direct bonding for 3D integration
URI https://ieeexplore.ieee.org/document/4546926
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV07a8MwED6STO3SR1L6xkOHDnViPfya04akkNIhhWzBkk5QCnEIzpJf35NffdChmywMtjihu-9033cAd8Ya2rXW-qkNQgIoIfpZytB3tk64wViGjuA8f4mmb_J5GS478NByYRCxLD7DoRuWd_km1zuXKhvJkMAcj7rQTQJecbXafAqFJhSJtKcwd7p1ZWO5hOCR4MuG1EX4hIWN1lP9zOrrThako9lsMa5KLOuv_Wi7UnqdyRHMm_-tik0-hrtCDfX-l5Tjfxd0DIMvfp_32nquE-jg-hQOv0kT9uF-nG82uPUql-epvGS_eBTieuLRa0QmyKgDWEyeFuOpX3dV8N8pVCh8GzNFpy0hPxMnRqqMAJPmMqJ5gZHzVWFkBM9YYNFYmxpFIR5PMhmjYWkmzqC3ztd4Dl7AlDSB1FnGhYwSTa8KlEgjoaU24gL6bsmrTaWbsapXe_n39BUcVLUYLsNxDb1iu8MbcviFui0t_QmNKKIX
link.rule.ids 310,311,786,790,795,796,802,27958,55109
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV25TsNAEB2FUAANR4K4cUFBgRPv4asORAkkEYWR0kW2d1ZCkeIochq-nllfHKKgW68s26Ox9s2bnXkLcKe0or9WazvUjksExUU7DhnaxtcBV-hL1zQ4T2fe6E0-z915Cx6aXhhELIrPsGeGxV6-ytKtSZX1pUtkjns7sEs474Rlt1aTUaHghGKRZh3mRrmuOFouIIIk-Lxu6yKGwtxa7am6ZtWGJz21Px5Hg7LIsnrfj4NXCtwZHsK0_uKy3GTZ2-ZJL_34Jeb4X5OOoPvV4We9Nth1DC1cncDBN3HCDtwPsvUaN1YJelaSFf0vFgW5lni0apkJcmsXouFTNBjZ1bkK9jsFC7mtfZbQekvcT_mBkklMlCnl0qN5gZ5BK9dTgsfM0ai0DlVCQR4PYumjYmEsTqG9ylZ4BpbDEqkcmcYxF9ILUrpVoEQaiVSmSpxDx5i8WJfKGYvK2ou_p29hbxRNJ4vJePZyCftlZYbJd1xBO99s8ZrgP09uCq9_AlfopW0
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=2008+International+Interconnect+Technology+Conference&rft.atitle=Copper+direct+bonding+for+3D+integration&rft.au=Gueguen%2C+Pierric&rft.au=di+Cioccio%2C+Lea&rft.au=Rivoire%2C+Maurice&rft.au=Scevola%2C+Daniel&rft.date=2008-06-01&rft.pub=IEEE&rft.isbn=9781424419111&rft.issn=2380-632X&rft.eissn=2380-6338&rft.spage=61&rft.epage=63&rft_id=info:doi/10.1109%2FIITC.2008.4546926&rft.externalDocID=4546926
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=2380-632X&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=2380-632X&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=2380-632X&client=summon