Modelling Propagation Loss of PECVD Silicon Nitride Strip Waveguides: Evaluation and Assessment of Width Dependency
Measurements of the width-dependent propagation loss of 250 nm thick silicon nitride strip waveguides at 850 nm wavelength indicate good agreement with the theoretical model. The waveguides were fabricated by plasma-enhanced chemical vapor deposition (PECVD).
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Published in | 2021 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2 |
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Main Authors | , , , , , |
Format | Conference Proceeding |
Language | English |
Published |
OSA
01.05.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Measurements of the width-dependent propagation loss of 250 nm thick silicon nitride strip waveguides at 850 nm wavelength indicate good agreement with the theoretical model. The waveguides were fabricated by plasma-enhanced chemical vapor deposition (PECVD). |
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