Improvement of switching trade-off characteristics between noise and loss in high voltage MOSFETs
A new MOS-gate structure was proposed and demonstrated to improve the switching trade-off characteristics between noise and loss in high-voltage MOSFETs. The lightly p-doped dummy base layer under the gate electrode modulates C gd -V ds curve due to the depletion under high applied voltage and the t...
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Published in | 2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs pp. 316 - 319 |
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Main Authors | , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
01.05.2011
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Subjects | |
Online Access | Get full text |
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Summary: | A new MOS-gate structure was proposed and demonstrated to improve the switching trade-off characteristics between noise and loss in high-voltage MOSFETs. The lightly p-doped dummy base layer under the gate electrode modulates C gd -V ds curve due to the depletion under high applied voltage and the turn-off dV/dt can be suppressed even with high-speed switching. The fabricated device showed the surge voltage suppression of 50 V or the turn-off loss reduction of 20% in the turn-off switching test with an inductive load. In the flyback converter operation, it was also shown that the trade-off characteristics between the radiation noise and total power loss were improved by the proposed dummy base structure. |
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ISBN: | 9781424484256 1424484251 |
ISSN: | 1063-6854 1946-0201 |
DOI: | 10.1109/ISPSD.2011.5890854 |