Fabrication and characterization of thermal infrared sources

This work presents fabrication and characterization of thermal infrared sources based on chromium meander resistors obtained by microfabrication techniques. The infrared source fabrication is based on a simple technological approach which employs standard photolithography and wet etching processes....

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Bibliographic Details
Published in2017 International Semiconductor Conference (CAS) pp. 83 - 84
Main Authors Kusko, M., Stan, G.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2017
Subjects
Chromium
Electrodes
Gold
Infrared sources
Optical device fabrication
Resistors
Thermal resistance
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Summary:This work presents fabrication and characterization of thermal infrared sources based on chromium meander resistors obtained by microfabrication techniques. The infrared source fabrication is based on a simple technological approach which employs standard photolithography and wet etching processes. The electrical and optical characterization of the sources offered good results for 1 square mm area resistors based on 100 micrometers wide meanders.
DOI:10.1109/SMICND.2017.8101161