Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO 2 is chosen as a template candidate. RF sputtering of a CeO 2 target in combination with ion beam assisted deposition (IBAD) has been us...

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Bibliographic Details
Published in2006 IEEE 4th World Conference on Photovoltaic Energy Conference Vol. 2; pp. 1368 - 1371
Main Authors van Hest, M.F.A.M., Leenheer, A.J., Perkins, J.D., Teplin, C.W., Ginley, D.S.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.05.2006
Subjects
Crystalline materials
Crystallization
Glass
Grain boundaries
Ion beams
Ion sources
Radio frequency
Silicon
Sputtering
Substrates
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Summary:Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO 2 is chosen as a template candidate. RF sputtering of a CeO 2 target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO 2 . However the texture orientation could not be modified using ISD
ISBN:1424400163
9781424400164
ISSN:0160-8371
DOI:10.1109/WCPEC.2006.279686