Investigation of the Structure and Optical Properties of Thin Copper Films

Copper nanolayers were formed using the vacuum magnetron-assisted sputtering (direct current) in various technological modes (sedimentation speed, working pressure, discharge power). Results of microstructural study of the 1 nm to 65 nm thick copper nanofilms deposited on quartz, glass and silicon s...

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Bibliographic Details
Published in2018 IEEE 38th International Conference on Electronics and Nanotechnology (ELNANO) pp. 69 - 73
Main Authors Babych, B., Borisova, O., Machulianskyi, O., Rodionov, M., Verbitskiy, V., Machulianskyi, V., Yakymenko, Y.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.04.2018
Subjects
Copper
Magnetic resonance imaging
microstructure
nanofilms
Optical films
reflection spectrum
Sputtering
Substrates
transmission spectrum
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Summary:Copper nanolayers were formed using the vacuum magnetron-assisted sputtering (direct current) in various technological modes (sedimentation speed, working pressure, discharge power). Results of microstructural study of the 1 nm to 65 nm thick copper nanofilms deposited on quartz, glass and silicon substrates are presented. Spectra of transmission and reflection coefficients of the copper nanofilms were studied in the wavelength range from 0.2\ \mu\text{m} to 1.1\ \mu\text{m} , The transmission and reflection spectra of films correspond well to the known spectra of bulk materials. The obtained results are of practical importance for development of nanostructural systems with the preset optical properties and for design of functional devices to be used in optoelectronics, information and energy-saving technologies.
DOI:10.1109/ELNANO.2018.8477448