Plasma Surface Modification of Polymer Substrates for Selective Hydrophobic Control

The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO 2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle,...

Full description

Saved in:
Bibliographic Details
Published in2007 International Semiconductor Conference Vol. 1; pp. 91 - 94
Main Authors Avram, M., Avram, M.A., Bragaru, A., Ghiu, A., Iliescu, C.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2007
Subjects
Microchannel
Microfluidic
Microfluidics
Plasma applications
Plasma chemistry
Plasma materials processing
Plasma stability
Plasma temperature
Polymers
RIE
Surface topography
Surface treatment
Online AccessGet full text

Cover

More Information
Summary:The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO 2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle, superficial polymerization, or by creating hydrophilic regions and/or hydrophobic on the surfaces in contact with plasma. The argon-plasma annealing was used to generate the hydrophilic surfaces, and plasma of CF 4 or CF 4 with O 2 has been used to create hydrophobic surfaces.
ISBN:1424408474
9781424408474
ISSN:1545-827X
DOI:10.1109/SMICND.2007.4519654