Characterization of surface-state absorption in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents

We study surface-state absorption (SSA) in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents. We utilize two-photon-absorption as a self-benchmarking for extracting the SSA coefficient. Our measurements show an SSA coefficient of ~0.32/mm.

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Bibliographic Details
Published in2016 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2
Main Authors Yu Li, Poon, Andrew W.
Format Conference Proceeding
LanguageEnglish
Published OSA 01.06.2016
Subjects
Absorption
Optical surface waves
Optical waveguides
Photoconductivity
Pins
Silicon
Surface waves
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Summary:We study surface-state absorption (SSA) in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents. We utilize two-photon-absorption as a self-benchmarking for extracting the SSA coefficient. Our measurements show an SSA coefficient of ~0.32/mm.
DOI:10.1364/cleo_si.2016.sm2g.4